Photoelectron Spectrometer Product List and Ranking from 4 Manufacturers, Suppliers and Companies

[Analysis Case] Evaluation of Binding States in Secondary Battery Cathodes

You can evaluate the sample in its original state, from the binder and coating to the active substance.

Our organization conducts evaluations of the bonding state of cathodes in secondary batteries. X-ray photoelectron spectroscopy (XPS), which is one of the methods for analyzing surface states, is suitable for evaluating binders and conductive additives due to its shallow detection depth (approximately 10 nm). Hard X-ray photoelectron spectroscopy (HAXPES), which uses hard X-rays (Ga rays) for excitation, allows us to obtain information about active materials buried under binders without causing damage, thanks to its deeper detection depth. 【Measurement and Processing Methods】 ■ [XPS] X-ray Photoelectron Spectroscopy ■ [HAXPES] Hard X-ray Photoelectron Spectroscopy ■ Processing under controlled atmosphere *For more details, please download the PDF or feel free to contact us.

Company：一般財団法人材料科学技術振興財団　MST
Price：Other

Contract Analysis

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

HAXPES Lab system

A window to the bulk" , "Beam time at your fingertips

This is a lab-type photoelectron spectroscopy system that uses hard X-rays as the excitation source. Hard X-ray Photoelectron Spectroscopy (HAXPES) is one of the next-generation photoelectron spectroscopy (XPS) techniques that many synchrotron facilities have already adopted. It is gaining attention as a method that can provide information about the substrate of films, buried interfaces, and deep inner shell orbitals that are not accessible with conventional XPS. By placing this system in your lab, you can enable next-generation photoelectron spectroscopy measurements that provide not only surface information but also bulk information, a technique that was previously only measurable at synchrotron facilities.

Company：シエンタオミクロン
Price：Other

Analytical Equipment and Devices

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

JPS-9030 Photoelectron Spectroscopy Device (XPS)

Something that everyone can easily use right away.

Japan Electronics Co., Ltd. JPS-9030 Photoelectron Spectroscopy System (XPS) adopts a newly designed user interface that can be operated in a Japanese environment, achieving "anyone can easily and immediately use it." In addition, it comes standard with a Kaufman-type etching ion source and twin anodes, and while being a general-purpose XPS, it also has a wide range of expandability, including a high-temperature heating system and gas cluster ion source. 〇 Features - Depth profiling (depth direction analysis) that accommodates a wide range of purposes from nm to μm - Newly developed software focused on ease of use - Ultra-high sensitivity comparable to high-end models - Abundant options *For more details, please download the PDF or feel free to contact us.

Company：アズサイエンス松本本社
Price：50 million yen-100 million yen

Analytical Equipment and Devices

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Evaluation of surface oxide film thickness using photoelectron spectroscopy.

Calculate the oxide film thickness of the SiO2 surface oxide film on the Si substrate using photoelectron spectroscopy!

In the process of forming an oxide film, controlling the thickness of the oxide film is one of the very important factors. Therefore, we estimated the thickness of the surface oxide film non-destructively using photoelectron spectroscopy. In samples covered with a thin oxide film, many elemental photoelectron peaks show a two-peak structure corresponding to the oxide component and the substrate component. By measuring the spectral intensity of each component, we can estimate the thickness of the oxide film. There are several analytical methods to determine film thickness non-destructively, but compared to other methods, the ability to estimate the thickness at specific locations is a characteristic of this method. *For more detailed information, please refer to the attached PDF document. For further inquiries, feel free to contact us.*

Company：東芝ナノアナリシス
Price：Other

Other analysis and evaluation services

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration

Photoelectron Spectrometer Product List and Ranking from 4 Manufacturers, Suppliers and Companies