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Photoelectron Spectrometer - List of Manufacturers, Suppliers, Companies and Products

Photoelectron Spectrometer Product List

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HAXPES Lab system

HAXPES Lab system

A window to the bulk" , "Beam time at your fingertips

This is a lab-type photoelectron spectroscopy system that uses hard X-rays as the excitation source. Hard X-ray Photoelectron Spectroscopy (HAXPES) is one of the next-generation photoelectron spectroscopy (XPS) techniques that many synchrotron facilities have already adopted. It is gaining attention as a method that can provide information about the substrate of films, buried interfaces, and deep inner shell orbitals that are not accessible with conventional XPS. By placing this system in your lab, you can enable next-generation photoelectron spectroscopy measurements that provide not only surface information but also bulk information, a technique that was previously only measurable at synchrotron facilities.

  • Analytical Equipment and Devices

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JPS-9030 Photoelectron Spectroscopy Device (XPS)

JPS-9030 Photoelectron Spectroscopy Device (XPS)

Something that everyone can easily use right away.

Japan Electronics Co., Ltd. JPS-9030 Photoelectron Spectroscopy System (XPS) adopts a newly designed user interface that can be operated in a Japanese environment, achieving "anyone can easily and immediately use it." In addition, it comes standard with a Kaufman-type etching ion source and twin anodes, and while being a general-purpose XPS, it also has a wide range of expandability, including a high-temperature heating system and gas cluster ion source. 〇 Features - Depth profiling (depth direction analysis) that accommodates a wide range of purposes from nm to μm - Newly developed software focused on ease of use - Ultra-high sensitivity comparable to high-end models - Abundant options *For more details, please download the PDF or feel free to contact us.

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Evaluation of surface oxide film thickness using photoelectron spectroscopy.

Evaluation of surface oxide film thickness using photoelectron spectroscopy.

Calculate the oxide film thickness of the SiO2 surface oxide film on the Si substrate using photoelectron spectroscopy!

In the process of forming an oxide film, controlling the thickness of the oxide film is one of the very important factors. Therefore, we estimated the thickness of the surface oxide film non-destructively using photoelectron spectroscopy. In samples covered with a thin oxide film, many elemental photoelectron peaks show a two-peak structure corresponding to the oxide component and the substrate component. By measuring the spectral intensity of each component, we can estimate the thickness of the oxide film. There are several analytical methods to determine film thickness non-destructively, but compared to other methods, the ability to estimate the thickness at specific locations is a characteristic of this method. *For more detailed information, please refer to the attached PDF document. For further inquiries, feel free to contact us.*

  • Other analysis and evaluation services

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